通过固体填充焊镀
ATP提供嵌入式地连接形成了一个以通孔通过基体材料。这些连结提供便捷的手段获得表面接地,省去繁琐的引线接合法。解决了装配过程中存在将环氧树脂或焊锡粘贴到金属表面的元器件中的问题。
空心镀焊
穿孔电镀用激光或超声波钻孔,孔的最小直径可以到达材料厚度的一半。适用材料三氧化二铝,氮化铝,氧化铍和石英。
加强空心镀焊
加强空心镀焊式是在标准的空心镀焊上增加一个程序。这个应用程序是用于附加导电材料在通过孔。这个过程将确保增加稳定和电导在现有标准金属镀层。 金的镀层可以至少大于0.002”(0.0508mm)孔的直径。黄金在穿孔的厚度100-400µ”(2.5-10微米)。
聚酰亚胺填充焊
通孔充满绝缘聚酰亚胺。这将防止环氧绝缘插头和共晶焊料到达表面的电路,同时保持正反两面连续性。
Hollow Plated, Polyimide Filled, and Enforced Via Sizes
Substrate Thickness | Preferred Hole Diameter | Allowable Hole Diameter |
0.005" (0.127mm) | 0.004–0.005" (0.101–0.127mm) | ø.003–0.005" (0.076–0.127mm) |
0.010" (0.254mm) | 0.008–0.010" (0.202–0.254mm) | ø.006–0.010" (0.152–-0.254mm) |
0.015" (0.381mm) | 0.012–0.015" (0.305–0.381mm) | ø.008–0.015" (0.203–0.381mm) |
0.020" (0.508mm) | 0.015–0.020" (0.381–0.508mm) | ø.010–0.020" (0.254–0.508mm) |
0.025" (0.635mm) | 0.020–0.025" (0.508–0.635mm) | ø.012–0.025" (0.203–0.635mm) |
Au Solid Filled Via sizes
Substrate Thickness | Filled Via Diameter | Via Spacing Center to Center |
0.005" (0.127mm) | ø.004–0.005" (0.101-0.127mm) | 0.012" (0.305mm) |
0.010" (0.254mm) | ø.008–0.010" (0.202-0.254mm) | 0.025" (0.635mm) |
0.015" (0.381mm) | ø.008–0.012" (0.202-0.305mm) | 0.027" (0.685mm) |
0.020" (0.508mm) | ø.008–0.012" (0.202-0.305mm) | 0.029" (0.736mm) |
0.025" (0.635mm) | ø.010–0.012" (0.254-0.305mm) | 0.031" (0.787mm) |