低气金属铬粉
Low gasChromium metal powder
用途：溅射靶材、物理气相沉积、高温合金、用于高压真空开关触头及精密合金添加剂。
Uses: sputtering target, physical vapor deposition, high temperature alloy for high-voltage vacuum switch contacts and precision alloy additives.
|
牌号
brand
|
化学成分% chemical composition % |
|
≥ |
≤ |
|
Cr |
Fe |
Si |
Al |
O |
N |
|
JCr99 |
99.2 |
0.15 |
0.20 |
0.03 |
0.13 |
0.02 |
|
S |
P |
|
|
0.02 |
0.01 |
|
粒度size |
-100-300目或按需加工，100-300 mesh or on-demand processing. |
|
包装packing |
100公斤/桶.-100 kg / barrel |
