微电子、电池工业用水
Pure water for Micro-electronics, batteries industrial
应用领域和指标要求参考
Reference of applications areas and indexes required
用途Applications | 用水指标Water Indicators | 参考标准Reference standard |
单晶硅、多晶硅、太阳能电池、氧化铝坩埚、光伏玻璃等生产 Monocrystalline silicon, polycrystalline silicon, solar cells, alumina crucible, photovoltaic glass, and other production | 电阻率15 ~18.25 MΩ.CM Resitivity15 ~18.25 MΩ.CM | 我国电子级水质技术指标，GB11446-1-1997 The water quality of China's electronic-grade technical indicators GB11446-1-1997 美国半导体工业用纯水指标 The industrial pure water indicators of U.S. semiconductor |
单晶硅半导体集成电路块，显像管、玻壳、液晶显示器等制造工业 Monocrystalline silicon semiconductor chips, tubes, glass, liquid crystal displays and other manufacturing industries | 电阻率15 ~18.25 MΩ.CM Resitivity15 ~18.25 MΩ.CM | 美国半导体工业用纯水指标 The industrial pure water indicators of U.S. semiconductor 我国电子级水质技术指标，GB11446-1-1997 Chinese electronic-grade water quality technical specifications GB11446-1-1997
|
光学材料清洗用水、电子陶瓷行业用纯水、尖端磁性材料用纯水 Pure water for optical materials, electronic ceramics and cutting-edge magnetic materials | 电阻率10 ~17 MΩ.CM Resitivity10 ~17 MΩ.CM | 我国电子级水质技术指标，GB11446-1-1997 Chinese electronic-grade water quality technical specifications GB11446-1-1997 美国半导体工业用纯水指标 The industrial pure water indicators of U.S. semiconductor |
蓄电池、锂电池、锌锰电池生产 Batteries, lithium batteries, zinc-manganese battery production | 电阻率5 ~10 MΩ.CM Resitivity5 ~10 MΩ.CM | 我国电子级水质技术指标，GB11446-1-1997 Chinese electronic-grade water quality technical specifications GB11446-1-1997 |
有色金属、贵金属冶炼用水、纳米级新材料生产用水、航空新材料生产用水、ITO导电玻璃制造用水、电子级无尘布生产用水 Pure water for non-ferrous metals, precious metals smelting, nano-scale production of new materials, aviation and production of new materials, ITO conductive glass, production of electronic-grade for dust-free cloth | 电阻率15 ~18.25 MΩ.CM Resitivity15 ~18.25 MΩ.CM | 我国电子级水质技术指标，GB11446-1-1997 Chinese electronic-grade water quality technical specifications GB11446-1-1997
美国半导体工业用纯水指标 The industrial pure water indicators of U.S. semiconductor |
主要工艺流程和出水指标：
Main technical process and standard of output water
※预处理+反渗透+离子交换器（电阻率≥15MΩ.CM）
Pre-treatment+ stage reverse osmosis system+ion exchange (electric conductivity≥15MΩ.CM）
※预处理+二级反渗透+EDI（电阻率≥15MΩ.CM）
Pre-treatment+ stage reverse osmosis system+EDI (electric conductivity≥15MΩ.CM）
※ 预处理+二级反渗透+脱气膜+EDI +抛光混床（电阻率≥18.25MΩ.CM）
Pre-treatment+ double stage reverse osmosis system+air film+EDI +polishing mixed bed (electric conductivity≥18.25MΩ.CM）
详细工艺需根据原水设计情况进行设计
Details of the design process should be carried out according to the feed water quality.
纯水设备的主要特点
Main technics of pure water treatment equipment
▼结合电子工业用水连续生产的特性，采用了全膜法处理工艺（UF+RO+EDI）完成高纯水的制备工作； The electronics industry with the characteristics of continuous production of water, using the entire membrane treatment process (UF + RO + EDI) to complete the preparation of highly pure water work; ▼对于电子行业用水的特性，增强了对水中二氧化硅、重金属和有机碳的脱除； For the water features of electronics industry , enhanced to removal silica, heavy metals and organic carbon in water. ▼采用了氮封水箱解决了电子工业用水要求较高，水的储存容易污染问题； Using nitrogen sealed water tanks to solve the problems of electronics industry require a higher water use, water storage easy to pollution ; ▼采用进口反渗透膜，脱盐率高，使用寿命长，运行成本低廉，产水水质高而稳定； Adopted import reverse osmosis membranes, desalination rate is high, long service life, the operation cost is low, the output water quality is high and stable. On-line water quality monitoring and control, real-time monitoring of water quality to ensure safety of water quality. Automatic control procedure, also equipment with touch screen operation, easy to use, the operation is simple, safe. Correspond with the local water personalized design, considerate stackable design, small floor area, which can meet considerate needs. ▼运行费用及维修成本低，全自动运行，实现无人化管理操作。 Operating costs and maintenance cost low, automatic operation, can realize unmanned management operations. |
