| Part Number | Period | Lattice type | Groove depth | Feature Width | Size(mm) |
| S2D-24B1-0808-xxx-P | 500 | rect post | multiple 1 | 135 | 8×8.3×0.7 |
| S2D-18B1-0808-xxx-P | 500 | rect post | multiple 1 | 210 | 8×8.3×0.7 |
| S2D-24B2-0808-xxx-P | 600 | rect post | multiple 1 | 195 | 8×8.3×0.7 |
| S2D-18B2-0808-xxx-P | 600 | rect post | multiple 1 | 275 | 8×8.3×0.7 |
| S2D-24B3-0808-xxx-P | 700 | rect post | multiple 1 | 260 | 8×8.3×0.7 |
| S2D-18B3-0808-xxx-P | 700 | rect post | multiple 1 | 350 | 8×8.3×0.7 |
| S2D-18C1-0808-xxx-P | 500 | hex post | multiple 1 | 165 | 8×8.3×0.7 |
| S2D-24C2-0808-xxx-P | 600 | hex post | multiple 1 | 165 | 8×8.3×0.7 |
| S2D-18C2-0808-xxx-P | 600 | hex post | multiple 1 | 240 | 8×8.3×0.7 |
| S2D-24C3-0808-xxx-P | 700 | hex post | multiple 1 | 220 | 8×8.3×0.7 |
| S2D-18C3-0808-xxx-P | 700 | hex post | multiple 1 | 290 | 8×8.3×0.7 |
| S2D-24D2-0808-xxx-P | 600 | hex hole | multiple 1 | 180 | 8×8.3×0.7 |
| S2D-18D3-0808-xxx-P | 700 | hex hole | multiple 1 | 200 | 8×8.3×0.7 |
| S2D-24D3-0808-xxx-P | 700 | hex hole | multiple 1 | 290 | 8×8.3×0.7 |
6. Nanopatterned Silicon Stamps 纳米图案硅片
LightSmyth offers a large variety of nanomachined single crystal silicon substrates providing a low-cost entry into nanophotonics research for industry and academic institutions. The substrates may be used in a variety of applications in optics, photonics, biology, chemistry, physics (e.g. neutron scattering), polymer research, nanoimprinting, microfluidics and others. If desired, the substrates can be coated with metallic or dielectric coating. Most of the surface features have slightly trapezoidal cross-section profiles with straight parallel mesas and trenches. Lattice-like structures are available as well. A number of feature sizes and trench depth is available. SEM images of the substrates may be taken prior to shipment to verify the exact profile.
Dimensions shown in the table represent target value. Period has accuracy better than 0.5% while groove depth and the width of line and space may differ from the target values by 15%. SEM are given for illustration purposes. If more precise dimensional information is required, LightSmyth may provide an SEM of the specific piece of nanostamp you order as an optional service.
Specification 产品参数：
|
Description |
Value |
|
Substrate Width and Height Tolerance |
standard tolerance ± 0.2 mm |
|
Clear Aperture (CA) |
0.5 mm from substrate edge (the pattern may extend to the edge of the substrate) |
|
Substrate Thickness |
0.675 ± 0.050 mm |
|
Surface Quality in CA |
P/N ends with “-P”: 60/40 scratch/dig: 0.06 mm maximum scratch width, 0.4 mm maximum dig diameter. up to 20/10 specification may be provided at a premium |
|
Surface Quality in CA |
P/N ends with “-S”: Discounted grade due to surface quality. Has at least 80% of usable area. Up to 80/100 scratch/dig/particles and irregular substrate shape may present |
|
Surface Quality outside of CA |
no requirements |
|
Material |
Single crystal silicon, reactive ion etch |
