真空炉可处理320*320的基板，温度可以升到1000度
RTP炉提供上下交叉灯阵列独特的灯装置。温度分布的工具突出和无与伦比的温度均匀性产生过程的重复性。
行业应用:
Application:
Perfect for wafer up to 300 mm, 4 pcs 156 mm solar cells or substrates up to 320 x 320 mm.
Due to the gas sealed separation of the working capacity (chamber) from the lamp fields this is a perfect tool for contaminating processes. The chamber parts can be easily cleaned.
Through the chamber walls there can be led different feed throughs, like window for optica measurement tools, thermocouple feed through, gas inlets, etc.
The process cycles are very short due to fast reaching of vacuum with 10exp.-3 mbar (optional up to 10exp.-6 mbar).
Here are the most feasable applications:
Processes using also other contaminating processes possible and all other applications of a RTP/RTA oven are oblitgatory,like:- Annealing processes
- Rapid Thermal Processes
- SiAu, SiAl, SiMo alloying
- low k dielectrics
- post implanting annealing
- copper past firing
- resistor paste firing
- LTO
