ANNEALSYS
Rapid Thermal Processing
annealsys.net
Annealing, graphene CVD, selenization
退火，石墨烯化学气相沉积，硒化
Room temperature to 1500°C
室温至1500°C
Cold wall chamber technology
冷腔室壁技术
AS-Micro
3-inch system
快速热处理
Vacuum to high vacuum
真空至高真空
AS-One 100 / 150
100 mm & 150 mm systems
3-英寸设备
Low cost RTP for R&D
研发用低成本RTP设备
Single and double chamber versions
单腔和双腔版本
100 mm & 150 mm设备
R&D to production
研发及生产AS-Master
200 mm tool - RTP to RTCVD
200 mm设备- RTP 及RTCVD
Manual loading or
手动装载或
cassette to cassette
盒到盒装载