Equipment summary
K-TRX measures metal contamination with X-rays for
semiconductor wafer and the glass substrate, etc.
Application
The metal contamination confirmation of the semiconductor
wafer before and after the process.
The metal contamination confirmation such as particles with
the glass substrate.
Measurement method
X-rays are closely entered into the
sample, and fluorescence X-rays are
measured while total reflection.
Equipment feature
It is possible to analyze from a light element to a heavy element.
The metal contamination map is got by a map function.
It is possible to select an original option.
Equipment specification
We prepare X-ray source depending on each element, light element, transition element, and
heavy element.
The fluorescence X-rays detector is the latest non LN2 detector.
Low cost.
Typical Customers
INTEL, SMIC, UMC, TI, ASMC, etc.
