应用范围 主要用于镀制多种金属，也可以镀多层膜、合金膜及化学物膜，如镀超硬耐磨损膜、防腐蚀膜、装饰膜（金、银、黑、红、蓝、绿等颜色），结合磁控溅射技术可镀制多层复合膜。 结构特点 1、采用脉冲技术，使沉积粒子细化，膜的性能提高，且具有沉积速度快、离子能力大等特点； 2、配备柱状阴极点弧源和磁控溅射源，适合范围广； 3、新型靶源结构，有效提高离化率和膜层均匀性； 4、所镀膜层具有硬度高，膜层与基底结合强度好，耐酸、碱、盐的能力强的特点。

This equipment is designed to use advanced plasma technology, combining the technique of electric arc with that of ron sputtering coating, for achievement of golden imitative film, gold-saturated film, compound films such as TiN, ZrN and CrN films, as well as other superior decorating films on stainless steel, metallic alloy or ceramic products to realize the wear-resisting, anti-corrosive and decorative purposes. It is an ideal machine extensively used in ware making, watch making, ceramic products manufacturing and hardware products production, etc.

Features:

First, it is equipped with evaporation source of electric arc, coupled with ron sputtering source that may be used separately and simultaneously.

Second, it has filament heating and ionization elerating unit.

Third, by use of newly typed target source, the evenness of coating and efficiency of ion shooting can be realized.

Fourth, with advanced coating technology, it is suitable to make various kinds of ornamental films.